Seunghwan Lee, a master’s student in POSTECH’s Department of Electrical Engineering (advisor: Professor Rock-Hyun Baek), received the Samsung Award and KRW 1 million for the excellence of his paper presented at the 26th Korean Conference on Semiconductors, organized by DB HiTek, the Korea Semiconductor Industry Association (KSIA), and the Consortium of Semiconductor Advanced Research (COSAR).

The paper was titled “Observation of mobility and velocity behaviors in ultra-scaled Lg = 15 nm silicon nanowire p-MOSFETs with different channel diameters.”

It analyzed state-of-the-art gate-all-around silicon nanowire device characteristics using physical parameters. It was the first to identify nonlinear performance behavior occurring only at extremely short channel lengths, thereby suggesting directions for developing ultrafine devices.

The Korean Conference on Semiconductors is Korea’s largest academic conference in the semiconductor field. The 26th conference attracted 1,692 participants and featured 803 papers, of which 12 received Outstanding Paper Awards. The Samsung Award is an outstanding paper award sponsored by Samsung Electronics and presented to a student who has delivered an excellent paper.

The award ceremony took place on February 13, 2020, at the 27th Korean Conference on Semiconductors held at the High1 Grand Hotel.